Implantation Systems

Our proprietary Nested High Voltage (NHV) generators are uniquely suited for application in beamline implantation at high energies. These compact accelerators are capable of high current for deep implants into metals, plastics or semiconductors.

North Star's typical pulsed plasma sources provide:
• High densities
• Synchronization with the HV pulse
• Easy to use synchronization software
• High reliability

A typical North Star pulsed RF source power supply consists of a Laboratory DC power supply (which can be supplied by North Star, or provided by the customer), a pulse modulator box capable of producing voltages to 5 kV in the proper mode, and a resonant capacitor supplied by North Star for use with a customer-designed or North Star-provided antenna.  

Specifications of North Star Model RF-1-50
Plasma Implantation/Plasma Source

Pulsed RF Sources

North Star also builds custom pulsed vacuum arc and cold cathode Penning (PIG) ion sources. We have developed high current, short pulse modulators which are uniquely suited to conformal implantation. Computer controls integrate the individual systems with minimal complexity.

In a continuous plasma source, most of the plasma created is lost between pulses when no voltage is on. As a result, the average power levels required for densities of 10^11/cm^3 may be as high as 10 - 30 kW. By producing plasma in an intense pulse before the main pulse, the requisite plasma densities can be produced at 1 - 2 kW or less.

Signal inputs can be provided by our standard computer interface, an external signal source, or using a simple input oscillator. Typical operating conditions are 200 kHz, 10 cycles per macropulse (50 microseconds), 4 kV peak output voltage, 200 A circulating current in the antenna, 40 kW power coupled to the plasma through the antenna during a 70 microsecond burst at 500 Hz repetition rate.

Typical Specifications
Antenna Voltage                                      0 - 4 kV (typical antenna)

Antenna Voltage                                      0 - 3 kV (100 ohm load)

Typical Antenna Inductance                 15 - 50 µH

Peak Power                                               >40 kW

Operating Voltage                                   0 - 200 V

Average Power                                         1000 W

North Star will quote custom and semi-custom applications with requirements that deviate from standard product lines. Specifications and performance figures are subject to change without notice. Please contact us with your requirements or application needs to receive a quotation.

Plasma Implantation Plasma Source
North Star has developed high density pulsed RF ion sources and high current, short pulse modulators which are uniquely suited to the high plasma and current densities required by conformal implantation.
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Plasma Source Power Supply PPS-40
North Star's Plasma Source Power Supply PPS-40 produces on-demand, large volume plasma densities in excess of 1011/cc over 1 m3 for plasma ion implantation applications.
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High Energy Ion Implanters > 400 kV
North Star's Nested High Voltage Generator (NHVG)-based implantation systems are reliable, small, light weight, easily installed and easily moved in a fab or laboratory environment.
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